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GCS

Founded in 1997, as a California Corporation, Global Communication Semiconductors, LLC ("GCS") is an ISO-certified premier pure-play compound (III-V) semiconductor (GaAs, InP and GaN ) wafer foundry service provider that manufactures technology leading, high performance, high quality, semiconductor devices. Portfolio offerings include Radio Frequency Integrated Circuits (RFIC) and millimeter wave integrated circuits for the wireless communications markets and Photodetectors and Lasers for optical communications markets.

GCS offers foundry services for RF/Wireless and Optoelectronics in addition to GCS designed proprietary optical wafers and Advanced Optoelectronics Components (AOC).

  • Quality Policy
  • AS9100 ISO Certificate

Company History

Year-Month
Milestones
2018-09Xiamen Global Advanced Semiconductor Co., Ltd. became a subsidiary of the Company.
2018-06The Company's board of directors passed resolution to acquire 2% of Xiamen Global Advanced Semiconductor Co., Ltd. from San'an Optoelectronics Co., Ltd. and increase the Company's ownership to 51%.
2017-07GCS LLC acquires 100% shares of D-Tech Optoelectronics, Inc. in cash.
2016-11Entered into joint-venture agreement with San'an Optoelectronics Co., Ltd. under which a joint-venture company Xiamen Global Advanced Semiconductor Co., Ltd., which the Company owns 49%, was established.
2016-09Begins 6-inch VCSEL wafer fab foundry service.
2016-08The Company's board of directors terminates the merger agreement with San'an Optoelectronics Co., Ltd. on the merger with SAIC Acquisition, Inc.
2016-07Mass produced SiC JFET.
2016-03The Company's board of directors passed resolution to merge with SAIC Acquisition, Inc., a 100% owned subsidiary of San'an Optoelectronics Co., Ltd.
2015-12Successfully developed high-speed, low-loss planar RF PIN diode.
2015-12Completed Opto foundry process developments on 100G/400G InP-PIC and INP/Si-PIC).
2015-10Mass produced 25G 850nm GaAs PIN PD.
2015-08Mass produced 25G 1310-1550nm PIN (25G 1310-1550nm InGaAs/InP PIN PD).
2015-06Successfully developed high-performance Bulk Acoustic Wave Resonator.
2015-04Established Global Device Technologies, Co., Ltd.
2015-03Successfully developed low-loss millimeter-wave monolithic mixer diode.
2014-09Officially listed on the Taipei Exchange.
2014-03Successfully developed high-frequency and higher-breakdown-strength 0.15μm GaN on SiC technology and HEMT technology.
2013-09Successfully developed high-gain, high-efficiency and high-linearity InGaP HBT for 802.11ac and 3G/4G handsets.
2013-08Developed Super Low Noise E/D pHEMT for WLAN, GPS, DBS, and VSAT.
2013-07Contracted with a U.S. company for GaN on SiC technology.
2013-03Successfully developed wide band VCO HBT.
2013-02Successfully developed high voltage InGaP HBT P7 process for the next generation of small cell base station.
2013-02Successful certified for SiC power electric component processes from customer.
2012-02Received order from a major international IDM plant for HBT for satellite communications.
2011-10Successfully certified for GaN/Si high-power RF components from a U.S. company.
2011-08Successfully transferred multiple GaAs HBT and pHEMT techniques to world-class silicon foundry company.
2011-02Attained R&D proposal for GaN from a major international IDM.
2011-01GCS. C became known as Global Communication Semiconductors, LLC ("GCS LLC").
2010-12GCS Holdings, Inc. undertook share conversion with GCS, C.
2010-11Attained contracts for technology transfer from world-class silicon foundry for multiple InGaP HBT and pHEMT techniques.
2010-11GCS Holdings, Inc., was established in the Cayman Islands.
2008-08Commenced GaAs concentrated photovoltaic solar battery foundry.
2004-03Successfully developed the world's fastest InP HBT technique (Ft > 300 GHz) that could be applied to optical communication 40-100G Trans-impedance Amplifier (TIA) and high-speed test equipment IC.
2003-04Mass production of RF0.5µM pHEMT Switch.
2001-12Successfully developed InGaAs PIN Photodiodes.
2001-08Successfully developed the InP HBT technique.
2001-04Successfully developed the high voltage InGaP HBT technique.
2000-05Successfully developed GaAs PIN Photodiode.
1999-10Passed ISO 9001-2000 certification.
1998-12Successfully developed the InGaP HBT technique.
1997-08Global Communication Semiconductors, Inc. ("GCS. C") was established and set up a facility in Torrance, CA, USA.
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