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FREQ: 18.0 GHz Request a GCS PDK today
RF Semiconductor Portfolio

Advanced RF
Technologies for
Next-Gen Systems

Process Technology

 

Process Technology Table

TechnologyProcessApplication
GaN HEMT  0.4µm GaN/SiCWideband High Power Amplifier
0.25µm GaN/SiC (Gen 2)High Frequency High Power Amplifier, Sub-6 GHz MIMO
0.15µm GaN/SiCmmW Frequency Amplifier, up to Ka-Band
0.25µm GaN/Si (6" Wafer)Wideband PA for Low-Voltage Mobile, BTS & Phased Array Tx IC up to K-Band
InGaP HBT
Super-High fmax
  D1Low Phase Noise VCO
D5Wide tuning range VCO, Voltage Tunable MMIC Filters
SPE (Gen 2)FR3 Amplifier up to 15 GHz
InP HBT  DHBT3 & DHBT3BSuper-high-speed ICs
DHBT3B (Gen 2) Coming SoonUltra High FT > 400 GHz
GaAs pHEMT  0.5µm PowerPA and LNA up to 20 GHz
E/D-Mode pHEMTIntegrated Multifunction ICs
0.25µm PowerAmplifiers up to 40 GHz
0.25µm Low NoisemmW Low Noise Receiver up to Ka-Band
0.1µm LN/PowerLow Noise & Power Amplifier
RF Diodes  THz Schottky DiodeLow Loss Mixer up to mmW Frequencies
Varactor Junction DiodeWide Capacitance Tuning Range for 5G Beam Forming Network
RFPINRF Switches
RF Passives  High-Q LCR on GaAsFilter and Matching/Bias Network

Technology Platform

 

RF Technology Platform

High-Power RF (GaN)

  • GaN-on-SiC and GaN-on-Si HEMTs
  • 0.4 µm to 0.15 µm processes
  • High-voltage operation up to 100V

GaAs HBT (Super-High fmax)

  • Low phase noise InGaP/GaAs HBT
  • mmWave super-high fmax (>140 GHz)
  • VCO, mixer, and high-speed ICs
  • SPE Gen 2 up to 15 GHz (FR3)

Low Noise and Power RF (pHEMT)

  • 0.5 µm down to 0.1 µm nodes
  • High-gain LNAs & high-linearity power PAs
  • E/D-mode and mmW V-band integration

InP HBT

  • Industry-leading fT up to 340 GHz
  • fmax >400 GHz (DHBT3B Gen 2)
  • DHBT3 & DHBT3B processes
  • TIAs, laser drivers, mixed-signal ICs

THz & RF Diodes

  • Varactor, PIN, and Schottky nodes
  • THz mixers & monolithic receivers
  • Wide capacitance tuning structures

Integrated Passives (IPD)

  • IPD high-Q passive matching
  • Monolithic filter network design
  • Low-loss GaAs substrates

System Applications

 

System Applications

Wireless communication systems are evolving from sub-6 GHz 5G toward mmWave 5G/6G and SATCOM platforms operating in Ku-band and above. These systems rely heavily on phased-array architectures requiring tightly matched RF front-end components, including high-efficiency power amplifiers, low-noise amplifiers, switches, and phase shifters.

GCS Enablement

GCS RF technologies enable scalable performance across these architectures with optimized GaN, GaAs, InP, and diode processes designed for power efficiency, linearity, and mmWave operation.

Technology Highlights

 

Technology Highlights

01

GaN HEMT technologies support drain voltages up to 100 V with backside via options in circular (50 µm) and oval (30 µm × 60 µm) geometries. Available processes include 0.4 µm, 0.25 µm, and 0.15 µm nodes optimized for high-power and rugged RF applications.

02

The GaAs HBT portfolio includes next-generation mmWave super-high fmax devices (>140 GHz) and mature InGaP HBT platforms optimized for wireless infrastructure and aerospace & defense systems.

03

GaAs HBT processes (fT up to 60 GHz) achieve ultra-low phase noise performance down to −165 dBc/Hz at 10 kHz offset and support VCOs, prescalers, and phase detector MMICs. The D5 varactor enables voltage-tunable filter designs through wide C–V tuning range.

04

THz Diode series enable mmWave mixer applications, while wide-tuning varactor technology supports beamforming phase shifters for 5G, SATCOM, and radar systems.

05

InP HBT technologies provide industry-leading speed (fT up to 340 GHz) for TIAs, laser drivers, mixed-signal ICs, and mmWave amplifiers.

06

pHEMT technologies support RF switches, LNAs, and power amplifiers. 0.25 µm LN pHEMT enables ultra-low noise operation with integrated functionality, while 0.1 µm processes extend performance into the V-band.

07

An IPD (Integrated Passive Device) process is available for high-frequency wide-band filter design and heterogeneous RF integration.

08

All processes undergo rigorous reliability qualification and have been validated by leading IDMs across the U.S., Europe, and Asia. Full qualification data including ALT, HTRB, and stress testing results are available upon request.

Qualification & Reliability: All processes undergo rigorous reliability qualification and have been validated by leading IDMs across the U.S., Europe, and Asia. Full qualification data including ALT, HTRB, and stress testing results are available upon request.
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