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RF Semiconductor Foundry

Integrated Passive Device (IPD)

 

Process Summary

 

MMIC passive technology designed for compact size and low-cost manufacturing, enabling reduced component count for improved front-end module integration. It is ideal for low-pass filters and off-chip matching networks, and meets or exceeds environmental requirements. It also features large through-wafer via openings to support coplanar heterogeneous integration.

Applications

 
  • Off-Chip Matching Elements/Power combiners
  • Bandpass Filters (low & high-band) for Cell Phone PA
  • Minimize Parasitic and Interconnects for High-Frequency Module Integration of Different Chips

Process Features

 
  • Thin-Film Resistor
  • MIM Capacitor
  • Thick Metal for High-Q, Compact Spiral Inductors
  • Air-bridge or Polyimide Interconnect Options
  • Passive Integrated Circuits

Low Pass Filter

 
Image removed. Schematic
plot ipd 2 Simulation Results

Typical Parametric Data

 
MIM CapacitanceQ
0.5 pF240
1.0 pF370
2.4 pF520
Spiral InductorQ
14 nH*>18
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